"Understanding DC-Bias Sputtered Thorium Oxide Thin Films Useful in EUV" by William R. Evans, Sarah C. Barton et al.
 

Keywords

band gap, optical constant, thickness measurement, thorium oxide, spectroscopic ellipsometry, thoria, refractive index, DC-bias, sputtering, x-ray diffraction

Abstract

We use spectroscopic ellipsometry to determine the optical constants of seven thin-film ThO2 samples deposited by radio-frequency sputtering, thickness ranging between 24 and 578 nm, for the spectral range of 1.2 to 6.5. We used a hollow-cathode light source and vacuum monochromator to measure constants at 10.2 eV. None of the deposition parameters studied including DC-bias voltages successfully increased the n of (that is, densify) thoria films. The value of n at 3.0 eV is 1.86 ± 0.04. We find compelling evidence to conclude that the direct bad gap is at ~5.9 eV, clarifying the results of others, some of whom observed the absorption edge below 4 eV. the edge in the two thickest films is of a narrow feature (FWHM = 0.4 eV) with modest absorption (α~ 6µm-1, K~0.1). Absorption may go down briefly with increasing energy from 6.2 to 6.5 eV). But at 10.2 eV absorption is very high and index low as measured by variable angle reflectometry, α= 47.3 ± 5.5 µm-1 and K= 0.48 ± 0.05, and n= 0.87 ± 0.12.

Original Publication Citation

William R. Evans, Sarah C. Barton, Michael Clemens and David D. Allred, "Understanding DC-Bias Sputtered Thorium Oxide Thin Films Useful in EUV Optics [6317-37]," in: Advances In X-Ray/EUV Optics, Components, And Applications, edited by Ali M. Khounsary, and Christian Morawe, Proceedings of SPIE, 6317, 631711-1 to 8 (26). [http://spiedigitallibrary.org/proceedings/resource/2/psisdg/6317/1/631711_1?isAuthorized=no][http://dx.doi.org/1.1117/12.687499].

Document Type

Peer-Reviewed Article

Publication Date

2006-08-13

Permanent URL

http://hdl.lib.byu.edu/1877/2919

Publisher

Society of Photo Optical Instrumentation Engineers (SPIE)

Language

English

College

Physical and Mathematical Sciences

Department

Physics and Astronomy

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