Abstract
We have fabricated nanofuses from thin-film, arc-evaporation carbon for use in permanent data storage. Thin film carbon fuses have fewer fabrication barriers and retain the required resistivity and structural stability to work as a data storage medium. Carbon thin films were characterized for their electrical, microstructural, and chemical bonding properties. Annealing the thin-film carbon in an argon environment at 400°C reduced the resistivity from about 4*10-2 Ω cm as deposited down to about 5*10-4 Ω cm, allowing a lower blowing voltage. Nanofuses with widths ranging from 200 nm down to 60 nm were fabricated and tested. They blow with voltages between 2 V and 5.5 V, and the nanofuses remain stable in both a "1" and a "0" state under a constantly applied read voltage of 1 volt for over 90 hours, corresponding to a cumulative time of >1012 reads.
Degree
MS
College and Department
Physical and Mathematical Sciences; Physics and Astronomy
Rights
http://lib.byu.edu/about/copyright/
BYU ScholarsArchive Citation
Laughlin, Kevin Robert, "Thin Film Carbon Nanofuses for Permanent Data Storage" (2018). Theses and Dissertations. 6793.
https://scholarsarchive.byu.edu/etd/6793
Date Submitted
2018-04-01
Document Type
Thesis
Handle
http://hdl.lib.byu.edu/1877/etd10001
Keywords
nanofuse, permanent, data storage, fabrication, electron beam lithography, carbon
Language
english