Here, the authors report the fabrication of transparent polymer templates for nanostructured amorphous silicon photovoltaics using low-cost nanoimprint lithography of polydimethylsiloxane. The template contains a square two-dimensional array of high-aspect-ratio nanoholes (300 nm diameter by 1 µm deep holes) on a 500X500 nm^2 pitch. A 100 nm thick layer of a-Si:H was deposited on the template surface resulting in a periodically nanostructured film. The optical characterization of the nanopatterned film showed lower light transmission at 600-850 nm wavelengths and lower light reflection at 400-650 nm wavelengths, resulting in 20% higher optical absorbance at AM 1.5 spectral irradiance versus a nonpatterned film.
Original Publication Citation
The following article appeared in Lei Pei*, Amy Balls, Cary Tippets, Jonathan Abbott*, Matthew Linford, Jian Hu*, Arun Madan, David Allred, Richard Vanfleet, and Robert Davis, "Polymer Molded Templates for Nanostructured Amorphous Silicon Photovoltaics," Journal of Vacuum Science & Technology A 29(2), (211). and can be found at [http://avspublications.org/jvsta/resource/1/jvtad6/v29/i2/p2117_s1][http://dx.doi.org/1.1116/1.355472].`
BYU ScholarsArchive Citation
Pei, Lei; Balls, Amy; Tippets, Cary; Abbott, Jonathan; Linford, Matthew R.; Allred, David D.; Vanfleet, Richard R.; Davis, Robert C.; Hu, Jian; and Madan, Arun, "Polymer Molded Templates for Nanostructured Amorphous Silicon Photovoltaics" (2011). Faculty Publications. 817.
American Vacuum Society
Physical and Mathematical Sciences
Physics and Astronomy
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