Keywords
surface patterning, functionalization, silicon, nanoelectronics, biomedicine
Abstract
Surface modification and patterning at the nanoscale is a frontier in science with significant possible applications in biomedical technology and nanoelectronics. Here we show that an atomic force microscope (AFM) can be employed to simultaneously pattern and functionalize hydrogen-terminated silicon (111) surfaces. The AFM probe was used to break Si-H and Si-Si bonds in the presence of reactive molecules, which covalently bonded to the scribed Si surface. Functionalized patches and patterned lines of molecules were produced. Linewidths down to 30 nm were made by varying the force at the tip
Original Publication Citation
Wacaser, Brent A., Michael J. Maughan, Ian A. Mowat, Travis L. Niederhauser, Matthew R. Linford, and Robert C. Davis."Chemomechanical surface patterning and functionalization of silicon surfaces using an atomic force microscope." Applied Physics Letters
BYU ScholarsArchive Citation
Wascaser, Brent A.; Maughan, Michael J.; Niederhauser, Travis L.; Linford, Matthew R.; Davis, Robert C.; and Mowat, Ian A., "Chemomechanical surface patterning and functionalization of silicon surfaces using an atomic force microscope" (2003). Faculty Publications. 514.
https://scholarsarchive.byu.edu/facpub/514
Document Type
Peer-Reviewed Article
Publication Date
2003-02-03
Permanent URL
http://hdl.lib.byu.edu/1877/1257
Publisher
AIP
Language
English
College
Physical and Mathematical Sciences
Department
Physics and Astronomy
Copyright Status
© 2003 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Applied Physics Letters and may be found at http://link.aip.org/link/?APPLAB/82/808/1
Copyright Use Information
http://lib.byu.edu/about/copyright/