Keywords
plagiarism, sentence similarity, copyright, SimPaD
Abstract
Plagiarism is a serious problem that infringes copyrighted documents/materials, which is an unethical practice and decreases the economic incentive received by authors (owners) of the original copies. Unfortunately, plagiarism is getting worse due to the increasing number of online publications on the Web, which facilitates locating and paraphrasing information. In solving this problem, we propose a novel plagiarism-detection method, called SimPaD, which (i) establishes the degree of resemblance between any two documents D1 and D2 based on their sentence-to-sentence similarity computed by using pre-defined word-correlation factors, and (ii) generates a graphical view of sentences that are similar (or the same) in D1 and D2. Experimental results verify that SimPaD is highly accurate in detecting (non-)plagiarized documents and outperforms existing plagiarism-detection approaches.
Original Publication Citation
Nathaniel Gustafson, Maria Soledad Pera, and Yiu-Kai Ng. "Nowhere to Hide: Finding Plagiarized Documents Based on Sentence Similarity." In Proceedings of the 28 IEEE/WIC/ACM International Conference on Web Intelligence (WI'8), pp. 69-696, December 9-12, 28, Sydney, Australia.
BYU ScholarsArchive Citation
Gustafson, Nathaniel; Ng, Yiu-Kai D.; and Pera, Maria Soledad, "Nowhere to Hide: Finding Plagiarized Documents Based on Sentence Similarity" (2008). Faculty Publications. 150.
https://scholarsarchive.byu.edu/facpub/150
Document Type
Peer-Reviewed Article
Publication Date
2008-12-09
Permanent URL
http://hdl.lib.byu.edu/1877/2632
Publisher
IEEE
Language
English
College
Physical and Mathematical Sciences
Department
Computer Science
Copyright Status
© 2008 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.
Copyright Use Information
http://lib.byu.edu/about/copyright/