Abstract

Here, the authors report the fabrication of transparent polymer templates for nanostructured amorphous silicon photovoltaics using low-cost nanoimprint lithography of polydimethylsiloxane. The template contains a square two-dimensional array of high-aspect-ratio nanoholes (300 nm diameter by 1 µm deep holes) on a 500X500 nm^2 pitch. A 100 nm thick layer of a-Si:H was deposited on the template surface resulting in a periodically nanostructured film. The optical characterization of the nanopatterned film showed lower light transmission at 600-850 nm wavelengths and lower light reflection at 400-650 nm wavelengths, resulting in 20% higher optical absorbance at AM 1.5 spectral irradiance versus a nonpatterned film.

Original Publication Citation

The following article appeared in Lei Pei*, Amy Balls, Cary Tippets, Jonathan Abbott*, Matthew Linford, Jian Hu*, Arun Madan, David Allred, Richard Vanfleet, and Robert Davis, "Polymer Molded Templates for Nanostructured Amorphous Silicon Photovoltaics," Journal of Vacuum Science & Technology A 29(2), (211). and can be found at [http://avspublications.org/jvsta/resource/1/jvtad6/v29/i2/p2117_s1][http://dx.doi.org/1.1116/1.355472].`

Document Type

Peer-Reviewed Article

Publication Date

2011-04-01

Permanent URL

http://hdl.lib.byu.edu/1877/2903

Publisher

American Vacuum Society

Language

English

College

Physical and Mathematical Sciences

Department

Physics and Astronomy

Share

COinS