Investigating T-butyl-lithium For 13.5 Nm X-ray Source

Authors

Malcom Hicken, Brigham Young University
Dr. R. Steven Turley, Brigham Young University

Keywords

t-butyl-lithium, micro-circuitry pattern, silicon chips, Marx generator

College

Physical and Mathematical Sciences

Department

Physics and Astronomy

Abstract

Lithography is the process of focusing light to etch a micro-circuitry pattern on silicon chips. In order to get smaller patterns, and thus more condensed computer chips, bright sources of low-wavelength light are needed. The goal of this project was to produce a bright source of 13.5 nm extremeultraviolet radiation. A paper by J. J. Rocca alerted us to the possibility of using doubly-ionized lithium, whose 2s-1s transition gives off 13.5 nm radiation.1 T-butyl-lithium was selected as a compound that has a relatively high vapor pressure at low temperatures, thus avoiding the more elaborate high-temperature experimental set-up required for obtaining adequate vapor pressures from other lithium compounds.

Recommended Citation

Hicken, Malcom and Turley, Dr. R. Steven (2014) "Investigating T-butyl-lithium For 13.5 Nm X-ray Source," Journal of Undergraduate Research: Vol. 2014: Iss. 1, Article 1271.
Available at: https://scholarsarchive.byu.edu/jur/vol2014/iss1/1271