•  
  •  
 

Journal of Undergraduate Research

Keywords

situ ellipsometry, ultrahigh vacuum, thin film, deposition chamber

College

Physical and Mathematical Sciences

Department

Physics and Astronomy

Abstract

As current microtechnology advances toward building nanosize components for computers and aerospace devices, oxidation of thin films can have dramatic effects on the electronic and optical properties of these devices. In order to understand optical properties of thin film materials and their oxides in a high purity environment, we have been building an ultrahigh vacuum deposition chamber to achieve a base pressure under 10-9 torr. We have incorporated evaporation and sputtering capabilities to create thin films in vacuum, and an in situ ellipsometer to analyze the optical properties and oxidation of the films without exposure to atmosphere. This combined with an oxygen leak allows for control over the amount of oxidation on the films. Ruthenium was initially investigated with the chamber in high vacuum to understand initial oxidation of thin films, and the applicability of our chamber.

Download

Included in

Physics Commons

Share

COinS