Work Towards Building an Extreme Ultraviolet Ellipsometer

Authors

Cort N. Johnson, Brigham Young University
Dr. David D. Allred, Brigham Young University

Keywords

extreme ultraviolet, ellipsometry, polarized light, XUV, EUV

College

Physical and Mathematical Sciences

Department

Physics and Astronomy

Abstract

The extreme ultraviolet (EUV) optics group at Brigham Young University uses thin film technology to develop multiplayer mirrors and designed to reflect well at certain EUV wavelengths. We need methods of measuring layer thickness on the order of a few angstroms. One method often used in thin film sample analysis is ellipsometry.

Recommended Citation

Johnson, Cort N. and Allred, Dr. David D. (2014) "Work Towards Building an Extreme Ultraviolet Ellipsometer," Journal of Undergraduate Research: Vol. 2014: Iss. 1, Article 1257.
Available at: https://scholarsarchive.byu.edu/jur/vol2014/iss1/1257