Journal of Undergraduate Research
Keywords
microwave-generated hydrogen atoms, reducing agent, tungsten atomic layer deposition
College
Physical and Mathematical Sciences
Department
Physics and Astronomy
Abstract
Traditional micro fabrication processes are confined to a small subset of possible materials due to limitations on etching and are confined to low aspect ratio fabrication due to limits in both etching and stability of thicker film deposition processes.
Recommended Citation
Anderson, Jason Kyle and Allred, Dr. David
(2014)
"Developing Microwave-Generated Hydrogen Atoms as a Reducing Agent for Tungsten Atomic Layer Deposition,"
Journal of Undergraduate Research: Vol. 2014:
Iss.
1, Article 1229.
Available at:
https://scholarsarchive.byu.edu/jur/vol2014/iss1/1229