Understanding the Absorption Edge Energy Shift of Thorium Dioxide, Uranium Oxide, and Uranium Nitride in the EUV *Or* Optical Applications of Uranium Thin-Film Compounds For the Extreme Ultraviolet and Soft X-ray Region

Authors

Richard L. Sandberg, Brigham Young University
Dr. David D. Allred, Brigham Young University

Keywords

extreme ultraviolet, EUV, Thorium Dioxide, Uranium Oxide, Uranium Nitride

College

Physical and Mathematical Sciences

Department

Physics and Astronomy

Abstract

Recently, the extreme ultraviolet (EUV) and soft x-ray region of the electromagnetic spectrum (between about 1 and 100 nm in wavelength or 20 eV to 5 keV photon energy) has become increasingly important in technological applications. The next generation of optical technologies will include EUV astronomy, high resolution soft x-ray microscopy for medical/materials science imaging, and EUV computer lithography. These technologies all require optical devices: mirrors, lenses, and other imaging equipment. The Brigham Young University’s EUV Optics research team has been studying the properties of uranium as an EUV optical material for several years. Here I review the research I conducted at as part of my ORCA mentoring grant which has been to find and implement applications for uranium-based optics for the EUV and soft x-ray region and to understand the properties of these uranium-based thin films.

Recommended Citation

Sandberg, Richard L. and Allred, Dr. David D. (2013) "Understanding the Absorption Edge Energy Shift of Thorium Dioxide, Uranium Oxide, and Uranium Nitride in the EUV *Or* Optical Applications of Uranium Thin-Film Compounds For the Extreme Ultraviolet and Soft X-ray Region," Journal of Undergraduate Research: Vol. 2013: Iss. 1, Article 2718.
Available at: https://scholarsarchive.byu.edu/jur/vol2013/iss1/2718