Determining Ruthenium’s Optical Constants in the Spectral Range 11-14 nm

Authors

Luke J. Bissell, Brigham Young University
Dr. David Allred, Brigham Young University

Keywords

Ruthenium, optical constants, spectral range 11-14nm, EUV, extreme ultraviolet

College

Physical and Mathematical Sciences

Department

Physics and Astronomy

Abstract

Computers are getting faster, and as they do, computer chips are getting smaller. Photolithography is a process used to design nanoscale patterns on a computer chip. In photolithography, the image of a circuit pattern is transferred from a mask to the semiconductor wafer. This is accomplished by exposing the mask to light and then reflecting the mask’s image through a series of image-reducing multilayer mirrors. These mirrors focus the reduced circuit pattern on to the semiconductor wafer. The wavelength of light incident on the mask determines the size of the resolvable features on the wafer. It has been predicted that by 2006, the dimension of transistors on commercial computer chips will be ~ 100 nm. Light with a wavelength of 11-13 nm is necessary to obtain this resolution [1].

Recommended Citation

Bissell, Luke J. and Allred, Dr. David (2013) "Determining Ruthenium’s Optical Constants in the Spectral Range 11-14 nm," Journal of Undergraduate Research: Vol. 2013: Iss. 1, Article 2714.
Available at: https://scholarsarchive.byu.edu/jur/vol2013/iss1/2714