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Journal of Undergraduate Research

Keywords

electrical characterization, DNA-templated copper nanowires, electronic devices

College

Physical and Mathematical Sciences

Department

Chemistry and Biochemistry

Abstract

DNA-templated nanofabrication is a promising route toward miniaturization of electronic devices below the 100 nm range. We have developed methods for fabricating micrometer-length copper nanostructures with nanometer heights from DNA templates on silicon surfaces. These structures have been integrated into simple circuits for electrical characterization. Atomic force microscopy and transmission electron microscopy suggest that these constructs are composed of copper metal. However, copper metal was not detected by scanning electron microscopy analysis. The present structures have resistances in the TΩ range or higher, and approaches for achieving improved conductivity are presented.

Included in

Chemistry Commons

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