Anisotropic Etching in Silicon and Other Materials Using a Reactive Ion Etcher

Authors

Justin Henrie, Brigham Young University
Dr. Aaron Hawkins, Brigham Young University

Keywords

anisotropic etching, silicon, reactive ion etcher

College

Ira A. Fulton College of Engineering and Technology

Department

Electrical and Computer Engineering

Abstract

Microfabrication technology has been one of the major areas of advancement of technology from the latter half of the twentieth century until today. Initially, microfabrication wasn’t a new concept—it started as a way to make large, complex electronic circuits smaller, and therefore more durable and less power-consuming. With advances in microfabrication techniques, we are starting to be able to not only manufacture solid-state electronic devices on a microscopic scale, but also mechanical devices with moving parts that operate at incredible speeds.

Recommended Citation

Henrie, Justin and Hawkins, Dr. Aaron (2013) "Anisotropic Etching in Silicon and Other Materials Using a Reactive Ion Etcher," Journal of Undergraduate Research: Vol. 2013: Iss. 1, Article 1881.
Available at: https://scholarsarchive.byu.edu/jur/vol2013/iss1/1881