Journal of Undergraduate Research
Keywords
silicon oxide, silicon nitride deposition, plasma enhanced chemical vapor deposition, PECVD
College
Ira A. Fulton College of Engineering and Technology
Department
Electrical and Computer Engineering
Abstract
Abstract: Waveguides will become more important as optical networks replace traditional wire networks for data transfer. This research explores one method of creating multimode waveguide that uses Plasma Enhanced Chemical Vapor Deposition to grow oxide and nitride layers on Silicon.
Recommended Citation
Markham, Stephen and Hawkins, Dr. Aaron
(2013)
"Characterization of Silicon Oxide and Silicon Nitride Deposition Using Plasma Enhanced Chemical Vapor Deposition (PECVD),"
Journal of Undergraduate Research: Vol. 2013:
Iss.
1, Article 1876.
Available at:
https://scholarsarchive.byu.edu/jur/vol2013/iss1/1876