Keywords
mechanical attachment, carbon nanotubes, silicon dioxide, chemical-vapor deposition
Abstract
A self-aligned thin-film deposition technique was developed to mechanically attach carbon nanotubes to surfaces for the fabrication of structurally robust nanotube-based nanomechanical devices. Single-walled carbon nanotubes were grown by thermal chemical-vapor deposition (CVD) across 150-nm-wide SiO2 trenches. The nanotubes were mechanically attached to the trench tops by selective silicon tetraacetate-based SiO2 CVD. No film was deposited on the nanotubes where they were suspended across the trenches.
Original Publication Citation
Whittaker, Jed D., Markus Brink, Ghaleb A. Husseini, Matthew R. Linford, and Robert C. Davis."Self-aligned mechanical attachment of carbon nanotubes to silicon dioxide structures by selective silicon dioxide chemical-vapor deposition." Applied Physics Le
BYU ScholarsArchive Citation
Whittaker, Jed D.; Husseini, Ghaleb A.; Linford, Matthew A.; Davis, Robert C.; and Brink, Markus, "Self-aligned mechanical attachment of carbon nanotubes to silicon dioxide structures by selective silicon dioxide chemical-vapor deposition" (2003). Faculty Publications. 464.
https://scholarsarchive.byu.edu/facpub/464
Document Type
Peer-Reviewed Article
Publication Date
2003-12-22
Permanent URL
http://hdl.lib.byu.edu/1877/1357
Publisher
AIP
Language
English
College
Physical and Mathematical Sciences
Department
Chemistry and Biochemistry
Copyright Status
© 2003 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Applied Physics Letters and may be found at http://link.aip.org/link/?APPLAB/83/5307/1
Copyright Use Information
http://lib.byu.edu/about/copyright/