lattice orientations, diamond films, chemical vapors, silicon, Kikuchi diffraction
The lattice orientations near the interface of chemical vapor deposited diamond films on Si(001) have been studied by orientation imaging microscopy. This technique is based on the automated analysis of electron backscatter Kikuchi diffraction patterns. The electron beam has been scanned in discrete steps over the reverse side of the diamond film after having removed the substrate. The obtained data have allowed us to determine the texture and to visualize quantitatively the orientational arrangement of and among individual diamond crystallites in the near-interface region. A comparison with the orientation of the substrate has proved the existence of epitaxially nucleated grains. A high amount of twinned diamond has been deduced from the pole figures and verified by analysis of orientation correlations between neighboring crystallites. Moreover, the grain boundary maps have allowed us to monitor and quantify directly the occurring twin boundaries.
Original Publication Citation
Geier, S., M. Schreck, R. Hessmer, B. Rauschenbach, B. Stritzker, K. Kunze, and B. L. Adams. "Characterization of the near-interface region of chemical vapor deposited diamond films on silicon by backscatter Kikuchi diffraction." Applied Physics Letters 6
BYU ScholarsArchive Citation
Adams, Brent L.; Kunze, K.; Geier, S.; Hessmer, R.; Schreck, M.; Rauschembach, B.; and Stritzker, B., "Characterization of the near-interface region of chemical vapor deposited diamond films on silicon by backscatter Kikuchi diffraction" (1994). All Faculty Publications. 694.
Ira A. Fulton College of Engineering and Technology
© 1994 American Institue of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Applied Physics Letters and may be found at http://link.aip.org/link/?APPLAB/65/1781/1
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